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AmberTec™ UP6040 H/OH Mixed Bed Ion Exchange Resin for Ultra-Pure Water with 18 MΩ*cm Resistivity and Low TOC Contribution
Product Details:
| Place of Origin: | China |
| Brand Name: | Dupont |
| Certification: | ISO 9001 |
| Model Number: | DuPont™ AmberTec™ UP6040 H/OH |
Payment & Shipping Terms:
| Minimum Order Quantity: | 1 Set |
|---|---|
| Price: | Negotiable |
| Packaging Details: | Standard Export Wood Crate/Carton or Naked wrapped by film |
| Delivery Time: | 7 work days |
| Payment Terms: | T/T,Western Union,Paypal etc. |
| Supply Ability: | 60000 Units per Month |
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Detail Information |
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| Copolymer: | Styrene-divinylbenzene | Matrix: | Gel |
|---|---|---|---|
| Type: | Strong Acid Cation | Functional Group: | Sulfonic Acid |
| Physical Form: | Dark Amber, Translucent, Spherical Beads | ||
| Highlight: | 18 MΩ*cm resistivity Mixed Bed Ion Exchange Resin,Low TOC contribution Ultra-Pure Water Polishing Resin,Strong Acid Cation Resin H/OH Ion Exchange Resin |
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Product Description
The AmberTec™ UP6040 H/OH Mixed Bed Ion Exchange Resin is a premium-grade mixed bed deionization resin designed for final polishing applications in ultrapure water (UPW) treatment systems. Combining high-capacity strong acid cation resin in H⁺ form and strong base anion resin in OH⁻ form, this fully regenerated mixed bed resin provides exceptional ionic removal performance and helps achieve ultra-high resistivity water quality.
Designed for demanding industries requiring extremely clean water, AmberTec™ UP6040 H/OH delivers stable polishing performance with very low ionic leakage and controlled organic release. It is widely applied in semiconductor manufacturing, photovoltaic production, pharmaceutical water systems, laboratory purification, and power generation facilities.
The resin is optimized for use after reverse osmosis (RO), electrodeionization (EDI), or other deionization processes where final water quality improvement is required.
Designed for final-stage purification:
- Produces water quality up to: 18 MΩ·cm resistivity
- Extremely low ionic leakage
- Low TOC contribution
- Suitable for critical UPW applications
The resin system combines:
- Ionic form: H⁺
- High exchange capacity
- Efficient removal of positively charged ions
- Ionic form: OH⁻
- High purity hydroxide form
- Effective removal of negatively charged ions
Together they provide continuous ion removal and high-quality polishing performance.
- Wafer cleaning water
- Ultrapure process water
- Microelectronics manufacturing
- High-purity production water
- Cell manufacturing processes
- Purified water systems
- Laboratory high-purity water
- Critical process water treatment
- Boiler feed water polishing
- High-purity circulating water systems
- Mixed bed polishing vessels
- Packed bed deionization systems
- Replaceable resin cartridges
- Portable exchange deionization systems
- High-purity water circulation loops
| Property | Cation Resin | Anion Resin |
|---|---|---|
| Polymer Structure | Styrene-DVB | Styrene-DVB |
| Matrix Type | Gel | Gel |
| Functional Group | Sulfonic Acid | Trimethylammonium |
| Resin Type | Strong Acid Cation | Strong Base Anion Type I |
| Ionic Form | H⁺ | OH⁻ |
| Total Exchange Capacity | ≥2.00 eq/L | ≥1.10 eq/L |
| Water Retention Capacity | 45-51% | 54-60% |
| Ionic Conversion | ≥99% H⁺ | ≥95% OH⁻ |
| Parameter | Cation Resin | Anion Resin |
|---|---|---|
| Particle Diameter | 525 ± 50 μm | 630 ± 50 μm |
| Uniformity Coefficient | ≤1.20 | ≤1.20 |
| Fine Particles | ≤0.1% (<300 μm) | -- |
| Large Particles | ≤5.0% (>850 μm) | -- |
| Parameter | Typical Value |
|---|---|
| UPW Rinse Resistivity (10 min) | ≥18 MΩ·cm |
| Salt Challenge Resistivity (10 min) | ≥18 MΩ·cm |
| ΔTOC After Rinse | ≤3 ppb C |
| Parameter | Range |
|---|---|
| Operating Temperature | 15-25°C |
| Stable pH Range | 0-14 |
| Shipping Weight | Approx. 710 g/L |
Each production batch is evaluated through strict quality testing procedures including:
- Resistivity rinse testing
- TOC performance testing
- Kinetic performance verification
This ensures consistent resin quality for demanding ultrapure water applications.
Strong oxidizing chemicals may damage ion exchange resin materials under certain conditions. Proper chemical compatibility evaluation should be performed before operation.
Users should review relevant safety documentation and follow recommended handling procedures to ensure safe and reliable resin performance.
With high exchange efficiency, low organic release, and excellent polishing capability, AmberTec™ UP6040 H/OH provides a dependable solution for industries requiring stable and high-quality ultrapure water production.
