Veolia MK-3 EDI Stack 15 GPM Ultrapure Water for Semiconductor
Product Details:
Place of Origin: | China |
Brand Name: | VEOLIA |
Certification: | CE |
Model Number: | Veolia EDI Modules E-Cell MK-3 |
Document: | Veolia EDI catalog.pdf |
Payment & Shipping Terms:
Minimum Order Quantity: | 1 pc |
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Price: | Negotiable |
Packaging Details: | standard export packing |
Delivery Time: | 5- 8 work days |
Supply Ability: | 60000 Units per Month |
Detail Information |
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MK-3 Maximum Water Production (m3 /hr): | 4.5 | MK-3 Minimum Water Production (m3 /hr): | 1.6 |
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MK-3 Recovery: | Up To 96% | MK-3 Shipping Weight Of This Stack: | 100 Kg (220 Lbs) |
MK-3 Hardness (ppm As CaCO3 ): | <1.0 | Sodium Of This Stack: | ≤ 3 Ppb |
Boron Of This Stack: | As Low As 0.08 Ppb | PH Range: | 4 To 11 |
Color: | ≤ 5 APHA | Resistivity: | ≥ 16 MOhm-cm |
Module Application: | Industrial High Purity Water Preparation | ||
Highlight: | Veolia MK-3 EDI Stack,15 GPM ultrapure water system,semiconductor EDI water treatment |
Product Description
Industrial-grade continuous electrodeionization technology for semiconductor and flat panel display applications.
Attribute | Value |
---|---|
Maximum water production (m³/hr) | 4.5 |
Minimum water production (m³/hr) | 1.6 |
Recovery | Up to 96% |
Shipping Weight | 100 kg (220 lbs) |
Hardness (ppm as CaCO₃) | <1.0 |
Sodium | ≤ 3 ppb |
Boron | As low as 0.08 ppb |
pH Range | 4 to 11 |
Color | ≤ 5 APHA |
Resistivity | ≥ 16 MOhm-cm |
Application | Industrial High Purity Water Preparation |
Industrial-grade continuous electrodeionization technology utilizing DC electric fields to drive ion migration, combining ion-exchange resins and selective membranes for continuous impurity removal.
- In-situ electrochemical regeneration: Eliminates chemical acid/base regeneration
- Three-channel design: Counter-current operation reduces scaling risks (verified pressure drop: 1.4-3.4 bar)
- Chemical-free operation: Complies with ISO 14001 standards
- Compact modularity: MK-series depth 29-74 cm for space efficiency
- Thermal sanitization: Supports 85°C hot-water sanitization (≥160 cycles), meeting cGMP
- Energy optimization: 20% reduced energy consumption vs conventional EDI (0-400 VDC)





Parameter | Value |
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Nominal Flow | 3.4 m³/h (15 gpm) |
Flow Rate Range | 1.7 - 4.5 m³/h (7.0 - 20 gpm) |
Dimensions (W x H x D) | 30 cm x 61 cm x 54 cm (12" x 24" x 22") |
Product Water Quality | Resistivity ≥ 16 MOhm-cm, Sodium ≤ 3 ppb, Silica ≤ 5 ppb, Boron ≤ 0.08 ppb |
Removal Efficiencies | Sodium ≥ 99.9%, Silica up to 99%, Boron up to 96% |
Operating Parameters | Voltage 0-300 VDC, Amperage 0-5.2 ADC, Inlet Pressure ≤ 6.9 bar |
- Ultrapure water for semiconductor chip rinsing and microelectronics
- Demineralized boiler feed water for power plants and industrial facilities
- CE, RoHS, CSA, and EAC certified
- ISO 9001 and ISO 14001 compliant manufacturing
- UKCA certified
- Halal certified by IFANCA®





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